Design for Manufacturability with Advanced Lithography - Bei Yu & David Z. Pan

Design for Manufacturability with Advanced Lithography

By Bei Yu & David Z. Pan

  • Release Date - Published: 2015-10-28
  • Book Genre: Electrical Engineering
  • Author: Bei Yu & David Z. Pan
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Design for Manufacturability with Advanced Lithography Bei Yu & David Z. Pan read online review & book description:

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).  The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography.  Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
Enables readers to tackle the challenge of layout decompositions for different patterning techniques;
Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design;
Includes coverage of the design for manufacturability with E-Beam lithography.

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